Electronic Engineering Mcqs

What is VLSI Design? Very-large-scale integration (VLSI) is the process of creating an integrated circuit (IC) by combining thousands of

01. NMOS devices are formed in A. p-type substrate of high doping level B. n-type substrate of low doping level

11. The condition for linear region is A. Vgs lesser than Vt B. Vgs greater than Vt C. Vds lesser

21. Enhancement mode device acts as switch, depletion mode acts as _____ switch A. open, closed B. closed, open C.

31. _______ is used to deal with effect of variation A. chip level technique B. logic level technique C. switch

41. In nMOS device, gate material could be A. silicon B. polysilicon C. boron D. phosporus Answer Option : B

51. CMOS technology is used in developing A. microprocessors B. microcontrollers C. digital logic circuits D. all of the mentioned

61. N-well is formed by A. decomposition B. diffusion C. dispersion D. filtering Answer Option : B 62. ______ is

71. Advantages of E-beam masks are A. small feature size B. larger feature size C. looser layer D. complex design

81. The dopants are introduced in the active areas of silicon by: a) Diffusion process b A. Diffusion process B.